Managing Human Resources

Business & Money

Bohlander, George W.

Sherman, Arthur

Snell,Scott

Human Resources

South-Western

Managing Human Resources retains its unique orientation to overall practicality and real-world application. Practical tips and suggestions provide effective ways of dealing with problems in communication, leadership, discipline, performance appraisal, and compensation administration.

SNELL, SCOTT A.

Sherman, Arthur W.

South-Western College Pub.

This student supplement includes review questions that can be used to check understanding and prepare for examinations on each chapter in the text. The questions are arranged by the text's learning objectives so the student can quickly refer back to the text if needed.

Managing Human Resources (Study Guide)

Managing Human Resources, the market leader in its field, retains its unique orientation to overall practicality and real-world application. Practical tips and suggestions provide effective ways of dealing with problems in communication, leadership, discipline, performance appraisal, and compensation administration.

Suitable for advanced undergraduates and graduate students in engineering, this text introduces the concepts of plasma physics and magnetohydrodynamics from a physical viewpoint. The first section of the three-part treatment deals mainly with the properties of ionized gases in magnetic and electric fields, essentially following the microscopic viewpoint. An introduction surveys the concepts of ionized gases and plasmas, together with a variety of magnetohydrodynamic regimes. A review of electromagnetic field theory follows, including motion of an individual charged particle and derivations of drift motions and adiabatic invariants. Additional topics include kinetic theory, derivation of electrical conductivity, development of statistical mechanics, radiation from plasma, and plasma wave motion. Part II addresses the macroscopic motion of electrically conducting compressible fluids: magnetohydrodynamic approximations; description of macroscopic fluid motions; magnetohydrodynamic channel flow; methods of estimating channel-flow behavior; and treatment of magnetohydrodynamic boundary layers. Part III draws upon the material developed in previous sections to explore applications of magnetohydrodynamics. The text concludes with a series of problems that reinforce the teachings of all three parts.

Engineering Magnetohydrodynamics (Dover Civil and Mechanical Engineering)

Science & Math

Sutton, George W.

Physics

Dover Publications

This blend of behavioral science principles and traditional personnel and labor relations philosophies provides practical tips and suggestions for effective ways to dea with problems in communication, leadership, discipline, performance appraisal, and compensation administration. The tenth edition is revised to reflect the most current topics in strategy, HR legislation, HR tools and techniques, TQM issues, international issues, and much more!

Bohlander, George

Management & Leadership

This leading book emphasizes overall practicality and application. Practical tips and suggestions provide effective ways of dealing with problems in communication, leadership, discipline, performance appraisal, and compensation administration.

This book is in good condition! RustyRiver offers fast daily shipping and 100% customer satisfaction GUARANTEED! Moderate wear to cover.

Education & Teaching

SHERMAN

Studying & Workbooks

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology Series)

Engineering & Transportation

Engineering

Noyes Publications

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications

CAMERON, David

Kääriäinen, Tommi

Kääriäinen, Marja-Leena

Technology

Wiley-Scrivener

See the best price to sell, buy, or rent books by Sherman, Arthur. BookScouter helps to compare book prices from 25+ online bookstores and 30+ buyback vendors with a single search.

Books by Sherman, Arthur

See the best price to sell, buy, or rent books by Sherman, Arthur. BookScouter helps to compare book prices from 25+ online bookstores and 30+ buyback vendors with a single search.

Managing Human Resources

Managing Human Resources

Managing Human Resources (Study Guide)

Managing Human Resources

Engineering Magnetohydrodynamics (Dover Civil and Mechanical Engineering)

Managing Human Resources

Managing Human Resources

Managing Human Resources (Study Guide)

Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology Series)

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications